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Photoresist Technologies

Allowed resists:

AR-P 639.04
AR-P 649.04
AR-P 669.04
AR-P 669.07
AR-P 679.02
AR-P 679.03
AR-P 679.04
AR-P 617.08
(33%,Copolymer)
PI-2610
PI-2611
PI-2545
PI-2737
ma-N 2405
mr-UV Cur 21-100nm
XR-1541-006 (HSQ)
ZEP 520A-7
AZ 5214E
AZ nLOF 2020
UV 6-0.6
UV 26.06
SPR 220-7.0
SU-8-2000.5
SU-8-2002
SU-8-2005
SU-8-2010
SU-8-2025
SU-8-2050
SU-8-2100
SU-8 25
LOR 3B

Allowed developers:

AR-600-55
AR-600-56
AZ 326MIF
AZ 400K
ZED N50
PA-400D
ma-D 332s
ma-D525
ma-D 532
ma-D 533s
mr-Dev 600
MF-24A
MF-CD-26

Allowed removers:

EBR PG
PA-401 R
PA-400 R
ZDMAC
AR 300-70
AZ100 Remover
mr-Rem 660
mr-Rem 400

Allowed adhesion agents:

VM-652
TI PRIME
mr-APS1
ormo Prime

Allowed thinners:

AR 600-07
AR 600-09
AZ EBR Solvent
Ormo Thin
Su-8-2000 Thinner
Thinner mr-T 1070

Additional Information

Achtung!

Nur diese Resists sind in der HNF zugelassen!

Für den Gebrauch anderer Lacke müssen Sie die Genehmigung des HNF Office einholen.

Siehe auch Wiki

Only these resists are allowed in the HNF!

For the use of other resists you must obtain permission from the HNF Office.

See Wiki


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