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Curriculum Vitae

Dr. Jürgen Schubert

Birth:01.10.1958 in Cologne/Westf., Germany
Affiliation:Forschungszentrum Jülich, Germany
Peter Grünberg Institut (PGI-9)
D-52425 Jülich, Germany
Phone: (+49)2461-61-6379 Fax: (+49)2461-61-4673
E-Mail: j.schubert@fz-juelich.de
Position:Group Leader: Oxide thin film growth


Scientific Interests:

• epitaxial growth of Oxides using PLD and MBE
• high-k dielectrics for CMOS-devices (Moore and more Moore)
• Ternary oxide high-k dielectrics

 

Education & Career:
10/1978 - 4/1985Physics at Cologne University (Diploma) and FZJ
5/1985-12/1989PhD at Cologne University (Diploma) and FZJ
10/1989 -head of the PLD-lab in Institute of Thin Films and Ion Technology (ISI),
Research Centre Jülich
7/2002 - 7/2003sabbatical in the Oxide-MBE-laboratory of Darrell Schlom,
MRI
Penn State University, University Parc, USA
since 10/1989 -Researcher at Peter Grünberg Institute (formerly Institute of Bio- and Nanosystems)




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