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Photoresist Technologies

Attention: Only the following resists are allowed in the HNF!

If you want to use any other resist you have to apply for a permission at the HNF Office.

Allowed resists:

AR-P 639.04
AR-P 649.04
AR-P 669.04
AR-P 669.07
AR-P 679.02
AR-P 679.03
AR-P 679.04
AR-P 617.08
(33%,Copolymer)
PI-2610
PI-2611
PI-2545
PI-2737
ma-N 2405
mr-UV Cur 21-100nm
XR-1541-006 (HSQ)
ZEP 520A-7
AZ 5214E
AZ nLOF 2020
UV 6-0.6
UV 26.06
SPR 220-7.0
SU-8-2000.5
SU-8-2002
SU-8-2005
SU-8-2010
SU-8-2025
SU-8-2050
SU-8-2100
SU-8 25
LOR 3B

Allowed developers:

AR-600-55
AR-600-56
AZ 326MIF
AZ 400K
ZED N50
PA-400D
ma-D 332s
ma-D525
ma-D 532
ma-D 533s
mr-Dev 600
MF-24A
MF-CD-26

Allowed removers:

EBR PG
PA-401 R
PA-400 R
ZDMAC
AR 300-70
AZ100 Remover
mr-Rem 660
mr-Rem 400

Allowed adhesion agents:

VM-652
TI PRIME
mr-APS1
ormo Prime

Allowed thinners:

AR 600-07
AR 600-09
AZ EBR Solvent
Ormo Thin
Su-8-2000 Thinner
Thinner mr-T 1070

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